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Session 29 - High Resolution X-ray Imaging & Spectroscopy with AXAF.
Display session, Tuesday, June 10
South Main Hall,

[29.07] AXAF Synchrotron Witness Mirror Calibrations, 2-12 keV

J. J. Fitch, A. J. Burek, A. M. Clark, D. E. Graessle, B. Harris, D. A. Schwartz (SAO), R. L. Blake (Los Alamos National Lab)

We have completed another full year of reflectance calibrations of AXAF witness mirrors at the National Synchrotron Light Source, Brookhaven National Laboratory. At the NSLS, we have used Beamlines X8C (5-12 keV) and X8A (2-6.2 keV). These beamlines are sponsored by Los Alamos National Laboratory. All of the scheduled flats have been calibrated in the 5-12 keV range, and approximately one-fourth of those scheduled have been calibrated in the 2-6.2 keV range. The repeatability in the coating processes reported last year (SPIE, Denver, July 1996) has persisted with the measurement of additional mirrors. Optical constants from reflectances have been derived for six of the eight AXAF mirror elements, and a degree of spatial uniformity information exists for three of these six. The addition of a semitransparent monitor has markedly increased efficiency of measurements in the 5-12 keV range, and efforts are being made to provide such a monitor detector for the lower energy ranges. We report progress in reflectance data acquisition and optical constants derivations, and discuss implications of the results for the AXAF program.

This research is supported by the US D.O.E., and by NASA under contract NAS8-40224.

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